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| Product Designation | Product Designation |
| XRMAl (mono anode) |
Mechanical and chemical cleaning followed by in situ sputter clean before sputter coating withAl to 10μm |
| XRMAlB (mono anode) |
As XRMAL1 but with 100nm barrier layer beneath the Al |
| XRTAMgAl *(twin anode) |
Mechanical and chemical cleaning followed by in situ sputter clean before sputter coating withAl to 10μm, and Mg to 10μm |
| XRTAMgAlB *(twin anode) |
As XRTAMgAl1 but with 100nm barrier layer beneath |
| XRTAMgZr *(twin anode) |
Mechanical and chemical cleaning followed by in situ sputter clean before sputter coating withZr to 10μm, and Mg to 10μm. |
| XRTAMgZr B *(twin anode) |
As XRTAMgZr but with 100nm barrier layer beneath |
| XRTAMgY *(twin anode) |
Mechanical and chemical cleaning followed by in situ sputter clean before sputter coating withY to 10μm, and Mg to 10μm. |
| XRTAMgY B *(twin anode) |
As XRTAMgY but with 100nm barrier layer beneath |
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