Product Designation | Product Designation |
XRMAl (mono anode) |
Mechanical and chemical cleaning followed by in situ sputter clean before sputter coating withAl to 10μm |
XRMAlB (mono anode) |
As XRMAL1 but with 100nm barrier layer beneath the Al |
XRTAMgAl *(twin anode) |
Mechanical and chemical cleaning followed by in situ sputter clean before sputter coating withAl to 10μm, and Mg to 10μm |
XRTAMgAlB *(twin anode) |
As XRTAMgAl1 but with 100nm barrier layer beneath |
XRTAMgZr *(twin anode) |
Mechanical and chemical cleaning followed by in situ sputter clean before sputter coating withZr to 10μm, and Mg to 10μm. |
XRTAMgZr B *(twin anode) |
As XRTAMgZr but with 100nm barrier layer beneath |
XRTAMgY *(twin anode) |
Mechanical and chemical cleaning followed by in situ sputter clean before sputter coating withY to 10μm, and Mg to 10μm. |
XRTAMgY B *(twin anode) |
As XRTAMgY but with 100nm barrier layer beneath |
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